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NTMTM Series

Real-time temperature monitoring. Directly at the Tool. 

Non-contact in situ temperature monitoring solutions for demanding semiconductor manufacturing processes.

Stable Process Conditions Start with Accurate Temperature Data 

Temperature variation can impact process repeatability, chamber matching, and production consistency. 
The NTM Series combines near and long infrared pyrometry technologies, providing in-situ temperature monitoring solutions across a wide range of semiconductor applications.

Optimized for diverse process requirements, NTM delivers accurate temperature measurement, including real-time emissivity compensation and background subtraction, enabling consistent and repeatable manufacturing performance.

Designed for RTP, CVD, PVD, ALD, ALE, and single-wafer wet processing applications.

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Tight Temperature Control
Stable and repeatable process conditions.

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Non-Contact Monitoring 
Direct measurement without process interference.

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Exceptional Accuracy with Rapid Results
Fast, reliable temperature data.

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Proven Fab Reliability
Thousands of probes operating 24/7.

Applications and System Capabilities 

Typical Applications 

  • RTP

  • CVD

  • PVD

  • ALD & ALE

  • Single Wafer Wet Processing

  • Glass & SiC Processing 

System Features 

  • Same Point Temperature & Emissivity Measurement 

  • Non-Contact In Situ Monitoring

  • Broad Dynamic Range 

  • Advanced Background Radiation Compensation 

  • In Situ Calibration Sources

  • Thousands of Probes Operating 24/7

 Metrology Is Our Heart.
Accuracy Is Our DNA.

Key Questions. Clear Answers.

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How is measurement consistency maintained across chambers and over time?

Equi T is an in situ radiometric calibration source designed for NTM systems.

It provides rapid warm up, long term stability, and calibration verification for chamber matching, maintenance, troubleshooting, and tool to tool consistency across production environments.

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How is measurement accuracy maintained over time?

The NTM Series is designed for exceptional long-term measurement stability, minimizing the need for frequent recalibration.

For periodic calibration verification, CI SEMI also offers in situ calibration procedures using dedicated reference sources such as Equi T, supporting maintenance, troubleshooting, and chamber-to-chamber matching.

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What happens when emissivity changes during processing?

NTM DeLTA simultaneously measures wafer thermal emission and emissivity at the same point on the wafer and along the same optical path. Real time emissivity compensation enables accurate wafer temperature measurement throughout changing process conditions without relying on fixed emissivity assumptions. 

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